Mitigate electrostatic charge accumulation within the cleanroom environment; effectively dissipate static charges from the surfaces of silicon wafers, photomasks, and photoresist layers; prevent electrostatic discharge (ESD)-induced damage to sensitive microelectronic structures—including gate oxides, interconnect lines, and transistor circuits; minimize yield loss attributable to ESD-related defects; suppress electrostatic attraction of airborne particulates to mitigate particle-induced process anomalies; and ensure stable, controlled conditions essential for high-precision semiconductor fabrication processes, including photolithography, plasma etching, thin-film deposition, and thermal diffusion.
Installation site of the space ion rods
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